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Online Public Access Catalogue

题名/责任者:

Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California / Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.

出版发行项:

Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1985.

ISBN:

0892525746

载体形态项:

vi, 350 p. : ill. ; 28 cm.

丛编题名:

Proceedings of SPIE--the International Society for Optical Engineering ; v. 539

团体责任者:

International Society for Hybrid Microelectronics.

附加个人名称:

Thompson, L. F., 1944-

附加团体名称:

International Society for Hybrid Microelectronics.

附加团体名称:

Society of Photo-optical Instrumentation Engineers.

论题主题:

Photoresists-Congresses.

中图法分类号:

TB304-53

书目附注:

Includes bibliographies and index.

豆瓣简介：