安徽理工大学图书馆书目检索系统

Online Public Access Catalogue

题名/责任者:

Physics of thin films : advances in research and development.

出版发行项:

New York : Academic Press, c1963-c1994.

ISBN:

0125330081 (v. 8)

ISBN:

012533009X (v. 9)

ISBN:

0125330103 (v. 10)

ISBN:

0125330138 (v. 13)

ISBN:

0125330146 (v. 14)

ISBN:

0125330154 (v. 15)

ISBN:

0125330162 (v. 16)

ISBN:

0125330170 (v. 17)

ISBN:

0125330189 (v. 18)

ISBN:

0125330197 (v. 19)

载体形态项:

19 v. : ill. ; 24 cm.

附加个人名称:

Hass, Georg, 1906-

附加个人名称:

Francombe, Maurice H.

附加个人名称:

Hoffman, Richard W.

附加个人名称:

Vossen, John L.

论题主题:

Thin films.

中图法分类号:

O484

一般附注:

Volume editors: v.7-v. 8 / edited by Georg Hass, Maurice H. Francombe, Richard W. Hoffman ; v.10 / edited by Georg Hass, Maurice H. Francombe ; v.14-v.19 / edited by Maurice H. Francombe, John L. Vossen.

书目附注:

Includes bibliographical references and index.

内容附注:

gv. 14. Contemporary preparative techniques -- v. 15. Thin films for advanced electronic devices -- v. 16. Thin films for emerging applications -- v. 17. Mechanic and dielectric properties -- v. 18. Plasma sources for thin film deposition and etching -- v. 19. Optical characterization of real surfaces and films.

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