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西文图书1.Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California / TB304-53/I61/2
馆藏复本:2
可借复本:2 International Society for Hybrid Microelectronics.
SPIE--the International Society for Optical Engineering, c1985.
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西文图书2.Photoresist : materials and processes / TN405/D315
馆藏复本:1
可借复本:1 DeForest, William S.
McGraw-Hill, [1975]
(0) 馆藏