机读格式显示(MARC)

• 000 01083cam 2200385 a 4500

• 001 0000158839

• 003 CAL

• 005 20060926075800.0

• 008 060926s1993 nyua b 001 0 eng

• 010 __ |a 92036072

• 020 __ |a 0470220635 (J. Wiley)

• 020 __ |a 8122405614 (Wiley Eastern)

• 040 __ |a DLC |c DLC |d DLC

• 090 __ |a TN14/T163

• 093 __ |a TN14 |2 4

• 099 __ |a CAL 022000354876

• 100 1_ |a Tandon, U. S., |d 1952-

• 245 10 |a Patterning of material layers in submicron region / |c U.S. Tandon, W.S. Khokle.

• 260 __ |a New York : |b J. Wiley, |c 1993.

• 300 __ |a xii, 183 p. : |b ill. (some col.) ; |c 25 cm.

• 504 __ |a Includes bibliographical references and index.

• 650 _0 |a Integrated circuits |x Masks.

• 650 _0 |a Ion beam lithograph.

• 650 _0 |a Lithography, Electron beam.

• 650 _0 |a X-ray lithography.

• 700 1_ |a Khokle, W. S.

• 920 __ |a 211040 |z 1

• 920 __ |a 222010 |z 2

• 920 __ |a 211060 |z 1

• 920 __ |a 237010 |z 1

• 920 __ |a 235030 |z 1

• 920 __ |a 245010 |z 1

• 920 __ |a 213060 |z 1

• 920 __ |a 242120 |z 1

• 998 __ |a XJT