机读格式显示(MARC)

• 000 00694pam a2200241 a 4500

• 001 0000335534

• 003 CAL

• 005 20200825110200.0

• 008 971008s1983 nyua 001 0 eng d

• 020 __ |a 0126747806

• 040 __ |c SJT

• 090 __ |a TB7/S932

• 093 __ |a TB7

• 099 __ |a CAL 022000307942

• 100 1_ |a Stuart, R. V. |0 CAL n2005238274# |7 ba0yba0y

• 245 10 |a Vacuum technology, thin films, and sputtering : |b an introduction / |c R.V. Stuart.

• 260 __ |a New York : |b Academic Press, |c 1983.

• 300 __ |a viii, 151 p. : |b ill. ; |c 21 cm.

• 500 __ |a Includes index.

• 650 _0 |a Vacuum technology.

• 650 _0 |a Thin films.

• 650 _0 |a Cathode sputtering (Plating process)

• 998 __ |a SJT