机读格式显示(MARC)

• 000 01218cam a2200325 4500

• 001 0000341685

• 003 CAL

• 005 20200826094100.0

• 008 891205s1988 njua b 10110 eng

• 010 __ |a 88072320

• 040 __ |a DLC |c DLC |d DLC

• 050 00 |a TA2005 |b .S95 1988

• 082 00 |a 621.044 |2 20

• 090 __ |a TL62-53/S989

• 093 __ |a TL62-53

• 099 __ |a CAL 022000225392 |a CAL 022000886028

• 111 2_ |a Symposium on Plasma Processing |n (7th : |d 1988 : |c Atlanta, Ga.)

• 245 00 |a Proceedings of the Seventh Symposium on Plasma Processing / |c edited by G.S. Mathad, G.C. Schwartz, D.W. Hess.

• 260 __ |a Pennington, NJ : |b Electrochemical Society, |c c1988.

• 300 __ |a viii, 400 p. : |b ill. ; |c 23 cm.

• 490 0_ |a Proceedings / The Electrochemical Society, Inc. ; |v v. 88-22

• 500 __ |a Spine title: Plasma processing.

• 504 __ |a Includes bibliographies and indexes.

• 650 _0 |a Plasma engineering |x Congresses.

• 700 1_ |a Mathad, G. S. |0 CAL n2005160875# |7 ba0yba0y

• 700 1_ |a Schwartz, G. C. |0 CAL n2005219190# |7 ba0yba0y

• 700 1_ |a Hess, Dennis W. |0 CAL n2005104957# |7 ba0yba0y

• 740 0_ |a Plasma processing.

• 830 _0 |a Proceedings (Electrochemical Society) ; |v v. 88-22.

• 998 __ |a PUL