机读格式显示(MARC)

• 000 01757cam a2200421 a 4500

• 001 0000332590

• 003 CAL

• 005 20200901135900.0

• 008 980413m19631994nyua b 001 0 eng d

• 020 __ |a 0125330081 (v. 8)

• 020 __ |a 012533009X (v. 9)

• 020 __ |a 0125330103 (v. 10)

• 020 __ |a 0125330138 (v. 13)

• 020 __ |a 0125330146 (v. 14)

• 020 __ |a 0125330154 (v. 15)

• 020 __ |a 0125330162 (v. 16)

• 020 __ |a 0125330170 (v. 17)

• 020 __ |a 0125330189 (v. 18)

• 020 __ |a 0125330197 (v. 19)

• 040 __ |a PUL |c PUL |d SCT

• 090 __ |a O484/P578/1

• 090 __ |a O484/P578/2

• 090 __ |a O484/P578/7

• 090 __ |a O484/P578/9

• 093 __ |a O484 |2 3

• 099 __ |a CAL 022000199367 |a CAL 022000366229 |a CAL 022000322935 |a CAL 022000344928 |a CAL 021999625215

• 245 00 |a Physics of thin films : |b advances in research and development.

• 260 __ |a New York : |b Academic Press, |c c1963-c1994.

• 300 __ |a 19 v. : |b ill. ; |c 24 cm.

• 500 __ |a Volume editors: v.7-v. 8 / edited by Georg Hass, Maurice H. Francombe, Richard W. Hoffman ; v.10 / edited by Georg Hass, Maurice H. Francombe ; v.14-v.19 / edited by Maurice H. Francombe, John L. Vossen.

• 504 __ |a Includes bibliographical references and index.

• 505 20 |a gv. 14. |t Contemporary preparative techniques -- |g v. 15. |t Thin films for advanced electronic devices -- |g v. 16. |t Thin films for emerging applications -- |g v. 17. |t Mechanic and dielectric properties -- |g v. 18. |t Plasma sources for thin film deposition and etching -- |g v. 19. |t Optical characterization of real surfaces and films.

• 650 _0 |a Thin films.

• 700 1_ |a Hass, Georg, |d 1906-

• 700 1_ |a Francombe, Maurice H.

• 700 1_ |a Hoffman, Richard W.

• 700 1_ |a Vossen, John L.

• 998 __ |a PUL