机读格式显示(MARC)

• 000 00726cam a2200253 i 4500

• 001 0000345460

• 003 CAL

• 005 20200829161700.0

• 008 981216s1975 nyua b 00110 eng

• 010 __ |a 74020636 //r83

• 020 __ |a 0070162301

• 040 __ |c SJT

• 090 __ |a TN405/D315

• 093 __ |a TN405

• 099 __ |a CAL 022000330955

• 100 1_ |a DeForest, William S. |0 CAL n2005057516# |7 ba0yba0y

• 245 10 |a Photoresist : |b materials and processes / |c W. S. DeForest.

• 260 __ |a New York : |b McGraw-Hill, |c [1975]

• 300 __ |a xi, 269 p. : |b ill. ; |c 24 cm.

• 504 __ |a Includes bibliographical references and index.

• 650 _0 |a Photoresists.

• 650 _0 |a Integrated circuits.

• 650 _0 |a Printed circuits.

• 998 __ |a SJT