机读格式显示(MARC)

• 000 01209nam a2200289 a 4500

• 001 0000330474

• 003 CAL

• 005 20200901132300.0

• 008 981214s1985 waua b 10100 eng

• 020 __ |a 0892525746

• 040 __ |c SJT

• 050 00 |a TR940 |b .A478 1985

• 082 0_ |a 686.2/325 |2 19

• 090 __ |a TB304-53/I61/2

• 093 __ |a TB304-53

• 099 __ |a CAL 022000306379

• 110 0_ |a International Society for Hybrid Microelectronics.

• 245 00 |a Advances in resist technology and processing II : |b March 11-12, 1985, Santa Clara, California / |c Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.

• 260 __ |a Bellingham, Wash., USA : |b SPIE--the International Society for Optical Engineering, |c c1985.

• 300 __ |a vi, 350 p. : |b ill. ; |c 28 cm.

• 440 _0 |a Proceedings of SPIE--the International Society for Optical Engineering ; |v v. 539

• 504 __ |a Includes bibliographies and index.

• 650 _0 |a Photoresists |x Congresses.

• 700 1_ |a Thompson, L. F., |d 1944- |0 CAL n2005244929# |7 ba0yba0y

• 710 2_ |a International Society for Hybrid Microelectronics.

• 710 2_ |a Society of Photo-optical Instrumentation Engineers.

• 998 __ |a SJT