机读格式显示(MARC)

• 000 01454cam a2200325 a 4500

• 001 0000333140

• 003 CAL

• 005 20200810092100.0

• 008 820902s1982 gw a b 001 0 eng

• 010 __ |a 82016883 //r912

• 020 __ |a 0387118780 (U.S.)

• 020 __ |a 3540118780

• 040 __ |a DLC |c DLC |d DLC |d OCoLC

• 050 00 |a TK7871.85 |b .I587 1982

• 082 00 |a 621.3815/2 |2 19

• 090 __ |a TN305.3/I64

• 093 __ |a TN305.3

• 099 __ |a CAL 022000273840 |a CAL 022000385664 |a CAL 022000883892 |a CAL 022000634938

• 111 2_ |a Ion Implantation School |d (1982 : |c Berchtesgaden, Germany)

• 245 10 |a Ion implantation techniques : |b lectures given at the Ion Implantation School, in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, Berchtesgaden, Fed. Rep. of Germany, September 13-15, 1982 / |c editors, H. Ryssel and H. Glawischnig.

• 260 __ |a Berlin ; |a New York : |b Springer-Verlag, |c 1982.

• 300 __ |a xii, 372 p. : |b ill. ; |c 24 cm.

• 440 _0 |a Springer series in electrophysics ; |v v. 10

• 504 __ |a Includes bibliographical references and index.

• 650 _0 |a Ion implantation.

• 650 _0 |a Semiconductor doping.

• 711 2_ |a International Conference on Ion Implantation: Equipment and Techniques |n (4th : |d 1982 : |c Berchtesgaden, Germany)

• 700 1_ |a Ryssel, Heiner, |d 1941- |0 CAL n2005212360# |7 ba0yba0y

• 700 1_ |a Glawischnig, H. |q (Hans), |d 1939- |0 CAL n2005086798# |7 ba0yba0y

• 998 __ |a PUL