机读格式显示(MARC)

• 000 01040cam a2200313 a 4500

• 001 0000334557

• 003 CAL

• 005 20200817083200.0

• 008 730129m1972uuuunyua b 000 0 eng d

• 010 __ |a 72083120 //r82

• 020 __ |a 082476580x

• 020 __ |a 0824711432 (v. 1)

• 020 __ |a 082476580X

• 040 __ |c PUL |d JLU

• 090 __ |a O646.5/D573/5

• 093 __ |a O646.5 |2 5

• 099 __ |a CAL 022000291111 |a CAL 022001380185 |a CAL 022000890364

• 100 1_ |a Diggle, John W. |0 CAL n2005060264# |7 ba0yba0y

• 245 10 |a Oxides and oxide films / |c Edited by John W. Diggle.

• 260 __ |a New York, |b M. Dekker, |c 1972-

• 300 __ |a v. : |b ill.; |c 24 cm.

• 490 0_ |a The Anodic behavior of metals and semiconductors series

• 500 __ |a Vols. 3-4 edited by J.W. Diggle and A.K. Vijh; vols. 5-<6 > edited by A.K. Vijh.

• 504 __ |a Includes bibliographical references.

• 650 _0 |a Metallic oxides.

• 650 _0 |a Metallic films.

• 650 _0 |a Metals |x Anodic oxidation.

• 700 1_ |a Vijh, Ashok K. |0 CAL n2005254126# |7 ba0yba0y

• 998 __ |a PUL